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Near Threshold Timing Analysis and Signoff Accuracy

Achieving timing signoff accuracy for near threshold ultra-low voltage designs at advanced 5nm and below process technologies

SNUG Silicon Valley 2018 Custom Design Lunch

Accelerating Robust Custom Design

SNUG Silicon Valley 2018: IC Validator Panel Video

The IC Validator panel at SNUG Silicon Valley focused on how leading companies address the challenges, technologies and solutions related to a convergent and efficient physical signoff flow that ...

Solving Parasitic Modeling Challenges at 5nm and Below

This video will explain technical tips for overcoming parasitic modeling challenges at 5nm and below. We'll discuss the differences between QuickCap vs deterministic methods

Manufacturing Solutions to Accelerate Process Research and Development

For semiconductor manufacturers to develop nodes beyond 10 and 7nm, they must quickly and methodically explore many options in the areas of materials, process, devices, and lithography to find the ...

Innovation Through Technology Leadership and Partnership-Oriented DNA

The most advanced volume production nodes are 12/10 nanometers, while 8/7 nanometers, both immersion lithography and EUV, are in final stages of development, and will move into volume production soon

Smarter Signoff Analysis for Advanced Nodes

In this brief talk, Synopsys R&D will present a smarter solution to achieve fast and more efficient signoff analysis for advanced node multi-voltage designs

Platform-Wide Innovations to meet the Challenges of 5-nm and Beyond

The most advanced volume production nodes are 12/10 nanometers, while 8/7 nanometers, both immersion lithography and EUV, are in final stages of development, and will move into volume production soon

The Choice of Transistor Architecture for the 5-nm Node and Beyond

In this video, Synopsys R&D will discuss the most likely options for transistor architectures as we move beyond the 5-nm node and how this is demanding a broader solution of “variability-driven ...

Tech Talk: 5/3nm Parasitics

What to expect at future process nodes