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C/C++ for Complex Hardware Design

Nov 2010 - An increasing number of ASIC and FPGA designs are accelerating algorithms and applications directly in hardware (HW) circuits. These HW accelerator cores have become commonplace and are ...

My RTL is an Alien! - Automating ASIC to FPGA-Based Prototype Conversion

Sep 2013 - FPGA-based prototyping is gaining popularity because it provides an economical way to functionally verify an ASIC design by creating a prototype that runs close to "at speed." FPGA-based...

High Throughput GSPS Signal Processing Using Synthesizable IP Cores

Jan 2014 - This whitepaper illustrates how parallel processing synthesizable IP cores available in Synphony Model Compiler enable Giga Samples Per Second (GSPS) throughput on FPGAs, and efficient ...

Formality Error-ID Technology Defines Debug Productivity

Have you ever experienced the "now what" anxiety that accompanies a failing equivalence checking verification? Have you found yourself staring at a logic cone with thousands of gates and no clear ...

IC Validator

Comprehensive Signoff DRC / LVS Tool

SiliconSmart

Comprehensive Cell, I/O and Memory Characterization

DFTMAX Compression Shared I/O

Nov 2014 - This joint white paper with Arm highlights why shared I/O capability in DFTMAX compression and TetraMAX ATPG is the preferred approach for testing multicore Arm® processor designs

StarRC™ Custom: Next-Generation Modeling and Extraction Solution for Custom ...

May 2010 - Custom digital, analog/mixed-signal, and memory designs are particularly sensitive to the nanometer device parameters and parasitics

The Choice of Transistor Architecture for the 5-nm Node and Beyond

In this video, Synopsys R&D will discuss the most likely options for transistor architectures as we move beyond the 5-nm node and how this is demanding a broader solution of “variability-driven ...

Innovation Through Technology Leadership and Partnership-Oriented DNA

The most advanced volume production nodes are 12/10 nanometers, while 8/7 nanometers, both immersion lithography and EUV, are in final stages of development, and will move into volume production soon